PLASU Cut-Off Mark 2021/2022 Academic Session for all Courses

Would you love to know the PLASU cut off mark for 2021 for all courses? If yes, then this article will help you so much.

All the information concerning the Plateau State University JAMB cut-off mark and departmental cut off point for all courses will be communicated to you in this article.

The information on this page is for 2021/2022 academic session aspirants (including UTME and Direct Entry) who have chosen Plateau State University.

One of the principles governing the admission process at Plateau State University is that candidates must be admitted base on merit and qualification. Therefore, aspirants with qualified and higher scores will be considered first before the ones with lower scores.

PLASU JAMB Cut off Mark for 2021 is 170 for all Courses

There are more that you also need to know about PLASU 2021 cut off mark. The Departmental cut-off mark for all courses offered by the Plateau State University is also out for the 2021/2022 admission.

There is much to consider about the departmental cut-off mark. If you wish to apply and gain admission to study your dream course at Plateau State University, then knowing the departmental cutoff points for your course should be your target.

All undergraduate programs at Plateau State University have been assigned a suitable JAMB score range that aspirants must meet to be qualified for admission.

What is the JAMB Cut off Mark for PLASU?

The 2021 JAMB Cut off Mark for Plateau State University (PLASU) is 170

Below, is the breakdown of PLASU departmental cut off points for all courses required for admission for the 2021/2022 academic session and the required cutoff mark for Direct entry candidates.

Direct Entry Cut off Mark

The JAMB cut-off mark for Direct Entry Candidates seeking admission at Plateau State University (PLASU) is 170. The cut-off mark is the same for all courses and it’s only qualified candidates for the Post-UTME but not an assurance for admission.

Only the departmental cut off point is what can determine if a candidate will be considered for admission or not. With the departmental cutoff points below, you will be able to know if you are qualified for admission to your course.

Other requirements for direct entry applicants include:

• SSCE O’level Result or equivalent Result.
• A’ level (either of OND or NCE)
• JAMB Score of 170 or above

Plateau State University Departmental Cutoff Points

The following are the departmental cut off points required for all courses, departments, and across all faculties as related to each candidate’s course.

Disclaimer: PLASU does not disclose its departmental cutoff mark to the public. As a result, they may not also disclose it this year. Meanwhile, we can only estimate the cut-off mark for each course base on past years’ admission statistics.

PLASU aggregate score and admission Chances

This section will give you a better hint on how to calculate PLASU aggregate score and admission chances. The only assurance of gaining admission at Plateau State University is having a high JAMB score and good O’level result.

If the JAMB score requirement for your course is 170, you should do well to score as much as 230 or above. If you are applying for competitive courses like Law, Medicine, or Nursing, then you may need to score as much as 250 or above.

For example, the departmental cutoff point for engineering faculty might be 170 but that for Mechanical Engineering which is under the faculty maybe 200.

Practically, if an aspirant applies for Chemistry education with a JAMB score of 190 while the departmental cutoff point for Chemistry education is 170, such candidates might be very happy thinking he or she will surely gain admission.

But that is not the case because if Plateau State University needed about 100 students into the department of Chemistry and it happens that about 150 applicants score above 190, then theirs is no admission for candidates with a JAMB score of 190 except on conditions like, having a good SSCE result that extremely outranks every other applicant.